PP-UVFS-25.4-3.0-LLM371

Laser Mirrors

Laser Mirrors | PP-UVFS-25.4-3.0-LLM371

€140,00

Qty 5+ > €133,00/piece
Qty 10+ > €119,00/piece
Qty 20+ > €105,00/piece
Discount will be applied in cart page
If an official quotation is needed or products are not in stock, please send us a request

This is a Limited Supply product. Availability and order size affect lead time and price.

Material: UVFS (Corning 7980 0F)
Diameter: 25.4 mm +0/-0.1 mm
Thickness: 3 mm +/-0.05 mm
Clear Aperture: min. 21 mm centered
Surface Quality, S1: 20-10 S-D as per MIL-PRF-13830B
Surface Quality, S2: polished
Surface Flatness, S1: <λ/8 @633 nm over CA
Parallelism: < 1 arcmin
Protective chamfers: 0.2-0.4 mm x 45°
Chips: 0.2 mm stoned
Arrow Marks: Indicates S1 (laser engraved)
Markings: „193nm HR45“ laser engraved

Coatings (IBS):
S1 (arrow marks): HRa > 97.5% (>98% best effort) @ 193.4 nm, AOI 42-48°
S2: Uncoated

Inspection Report

In-stock items ship the next business day via DHL. Estimated delivery time: 1–2 business days (EU), 3–5 business days (Rest of World). View full shipping policy.

OPTOMAN’s Deep-UV IBS-coated Laser Mirrors are designed to deliver high reflectivity, and low absorption for reliable performance in ultraviolet laser applications. With coatings engineered specifically for the challenges of DUV wavelengths, these mirrors provide excellent resistance to environmental stress, and long-term optical stability under high average power or high repetition rate conditions.

These DUV mirrors are optimized for operation at 193 nm and a 42-48° angle of incidence, ensuring stable and efficient reflection of ArF laser beams.

IBS dielectric coatings advantages for ArF lasers compared to other solutions in the market:

  • No Aging (reflectance does not change over time)
  • Longer lifetime
  • Low loss and absorption

    HR > 99% @ 193nm, AOI=0-10° spherical mirrors are also available as well as custom size and wavelengths.

 Products marked with this tag are SuperHero Tier products. They possess the best capabilities of OPTOMAN and make our R&D department proud.

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