Substrate Material: UVFS
Dimensions: 25.4 mm +0/-0.1 mm
Thickness: 6.35 mm +/-0.1 mm
Clear aperture: min 20 mm
Surface quality, S1/S2: 20-10 S-D per CA as per MIL
Surface flatness, S1: <λ/8 @ 633 nm per CA
Parallelism: <5 arcmin
Protective chamfers: 0.2-0.4 mm x 45°
Coatings (IBS):
S1 (arrow marks): HRa>99.5% @ 355 nm, AOI=40 - 50 deg
S2: Uncoated
LIDT: >0.4 J/cm2, 355 nm, 5 ps, kHz (S-on-1, 200 um beam size)
