Ultrafast Laser Mirrors

Ultrafast Laser Mirrors

Ultrafast Laser Mirrors | PP-UVFS-25.4-6.35-ULLM13

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Substrate material: UVFS
Diameter: 25.4 mm +0/-0.1 mm
Thickness: 6.35 mm +/-0.1 mm
Clear aperture: >80%
Surface quality, S1: 10-5 S-D
Surface quality, S2: COMMERCIAL POLISH (80-50 S-D)
Surface flatness, S1: <λ/10 @ 633 nm over CA.
Parallelism: <10 arcsec
Protective chamfers: 0.1-0.4 mm x 45°
Coatings (IBS): S1: HRp>99.5%@ 327-363nm, HRs>99.75%@320 - 370 nm AOI=45°. GDD Rs=0 +/-10 fs2 @ 320 - 370 nm / AOI=45°. GDD Rp=0 +/-10 fs2 @ 330 - 360 nm / AOI=45°.
S2: Uncoated
LIDT: >0.1 J/cm2, 100 fs, 343 nm

Learn more about OPTOMAN ultrafast laser mirrors. 

Inspection Report

HRp>99.5% @ 327-363nm + HRs>99.75% @ 320 - 370 nm

 

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These highly reflective 343 nm UV dielectric mirrors are used for beam steering in third-harmonic Yb-based ultrafast laser systems, enabling clean routing of UV femtosecond and picosecond beams while preserving beam quality. They are commonly integrated into UV micromachining and microfabrication setups for precision ablation and surface structuring, high-duty-cycle glass processing and through-glass via (TGV) formation, and polymer structuring workflows where stable pointing is critical. Their low-loss UV coatings and high LIDT support reliable long-term operation in 343 nm beam paths where UV-induced aging and thermal drift can quickly limit standard mirrors.

Mirror can be used for III harmonic of Yb:YAG based ultrafast laser systems, such as:

  • “PHAROS” and “CARBIDE” by Light Conversion
  • “Monaco” series by Coherent
  • “FemtoBlade™” series by Lumentum
  • “TruMicro” series by TRUMPF
  • “IceFyre® FS” series by Spectra-Physics
  • “Satsuma” and “Tangor” series by Amplitude
  • “FemtoLux” series by EKSPLA
  • “FSL1030X2” by Thorlabs
  • “Jasper X1” by Fluence technology
  • “FS Series” by Photonics Industries

OPTOMAN’s UV IBS-coated Ultrafast Laser Mirrors are designed to deliver high reflectivity, low Group Delay Dispersion (GDD), and high LIDT, ensuring reliable performance in femtosecond and picosecond laser systems operating in the ultraviolet spectral range.

These mirrors are optimized for III harmonic operation at 343 nm and a 45° angle of incidence, providing high reflectivity and low GDD for ultrashort UV laser pulses.

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