Ultrafast Laser Mirrors

Ultrafast Laser Mirrors

Ultrafast Laser Mirrors | PP-UVFS-50.8-9.52-ULLM11

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Substrate material: UVFS
Diameter: 50.8 mm +0/-0.1 mm
Thickness: 9.52 mm +/-0.1 mm
Clear aperture: min. 40 mm
Roughness, S1: <5 A RMS
Surface quality, S1: 10-5 S-D over CA (as per MIL-PRF-13830B)
Surface flatness, S1: <λ/8 @ 633 nm over CA
Parallelism: <10 arcsec
Protective chamfers: 0.1-0.4 mm x 45° 
Coatings (IBS):
S1: HRs>98.5%@235 - 280 nm & HRp>97.5%@241 - 271 nm, AOI=45°
GDD Rsp=0 +/-10 fs2 @ 241 - 271 nm
S2: Uncoated

Learn more about OPTOMAN ultrafast laser mirrors. 

Inspection Report

HRs>98.5%@235 - 280 nm & HRp>97.5%@241 - 271 nm

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These highly reflective dielectric mirrors designed for deep-UV frequency-converted ultrafast laser systems enable precise beam steering of DUV femtosecond and picosecond pulses while preserving beam quality and maintaining stable spectral performance at short wavelengths. They are used in DUV beam delivery and optical layouts for applications such as UV micromachining and laser ablation, fine-feature polymer processing, surface structuring, and in multi-harmonic laser setups where the 257 nm path must be reliably separated and guided. Their low absorption coatings and high LIDT support long-term operation in DUV beam paths.

Mirror can be used for IV harmonic of Yb:YAG based ultrafast laser systems, such as:

  • “PHAROS” and “CARBIDE” by Light Conversion
  • “Monaco” series by Coherent
  • “FemtoBlade™” series by Lumentum
  • “TruMicro” series by TRUMPF
  • “IceFyre® FS” series by Spectra-Physics
  • “Satsuma” and “Tangor” series by Amplitude
  • “FemtoLux” series by EKSPLA
  • “FSL1030X2” by Thorlabs
  • “Jasper X1” by Fluence technology
  • “FS Series” by Photonics Industries

OPTOMAN’s UV IBS-coated Ultrafast Laser Mirrors are designed to deliver high reflectivity, low Group Delay Dispersion (GDD), and high LIDT, ensuring reliable performance in femtosecond and picosecond laser systems operating in the ultraviolet spectral range.

These mirrors are optimized for IV harmonic operation at 257 nm and a 45° angle of incidence, providing high reflectivity and low GDD for ultrashort DUV laser pulses.

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