High Power Thin-Film Polarizers

High Power Thin-Film Polarizers

High Power Thin-Film Polarizers | PP-UVFS-25.4-6.35-TFP67

$296.48

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Substrate material: UVFS
Diameter: 25.4 mm +0/-0.1 mm
Thickness: 6.35 mm +/-0.1 mm
Clear aperture: min 20 mm
Surface quality, S1/S2: 20-10 S-D per CA (MIL-PRF-13830B)
Surface flatness, S1: PV <λ/4@633 nm per CA
Parallelism: <30 arcsec
Protective chamfers: 0.1-0.4 mm x 45 deg
Chips: <0.2 mm
Coatings (IBS):
S1 (arrow marks): Rs>99.9% @ 1030 nm + Tp>98% (>99% best efforts) @ 1030 nm, AOI=45 deg +/-0 deg
S2: SCC + ARp<0.1% @ 1030 nm, AOI=45 deg
LIDT: optimised for 1030 nm, 300 fs, 100 uJ, 100 kHz, 2 mm beam diameter

Inspection Report

Raw Spectral Data

Rs>99.9% @ 1030 nm + Tp>98% (>99% best efforts) @ 1030 nm (TFP67)

Calculated transmittance values for s and p polarizations at 45° angle of incidence

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These thin-film polarizers are core polarization-control elements in Yb-doped ultrafast laser systems, separating s- and p-polarized light with high extinction while preserving beam quality. They are widely used in beam delivery and micromachining workstations for power control with a half-wave plate, pulse picking and attenuation schemes, and polarization cleanup before scanners, nonlinear stages, or sensitive diagnostics. Their low absorption coatings and high LIDT support stable long-term operation in high-power femtosecond and picosecond beam paths where polarization purity and thermal stability are critical.

TFP be used for I harmonic of Yb:YAG based ultrafast laser systems, such as:

  • “PHAROS” and “CARBIDE” by Light Conversion
  • “Monaco” series by Coherent
  • “FemtoBlade™” series by Lumentum
  • “TruMicro” series by TRUMPF
  • “IceFyre® FS” series by Spectra-Physics
  • “Satsuma” and “Tangor” series by Amplitude
  • “FemtoLux” series by EKSPLA
  • “FSL1030X2” by Thorlabs
  • “Jasper X1” by Fluence technology
  • “FS Series” by Photonics Industries

OPTOMAN’s Ultrafast IBS-coated High Power Thin-Film Polarizers are designed to efficiently separate s- and p- polarized light with a high extinction ratio, while maintaining high LIDT and minimal Group Delay Dispersion (GDD) for preserving pulse duration and handling high peak intensity of femtosecond and picosecond laser systems. This polarizer is optimized for 1030 nm at a 45° angle of incidence.

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