Ultrafast Laser Mirrors

Ultrafast Laser Mirrors | PP-UVFS-25.4-6.35-ULLM3

$132.97

Qty 5+ > $126.33/piece
Qty 10+ > $113.03/piece
Qty 20+ > $99.73/piece
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Material: UVFS (C7980 0F)
Dimensions: 25.4 mm (+0/-0.1 mm)
Thickness: 6.35 mm (+/-0.1 mm)
Clear aperture: >80%
Surface quality, S1: 10-5 S-D over CA
Surface flatness, S1: <λ/8@633 nm over CA
Parallelism: <5 arcmin
Protective chamfers: 0.1 - 0.4 mm x 45°

Coatings (IBS)
S1: HRs>99.95% & HRp>99.9%@ 500 - 530 nm, AOI=45 deg,
|GDD Rs, Rp|<20 fs2 @ 500 - 530 nm, AOI=45 deg
S2: Stress Compensating Coating

LIDT (estimate):
> 0.15 J/cm2, 515 nm, 500 fs, 10 kHz, p-pol
> 0.3 J/cm2, 515 nm, 500 fs, 10 kHz, s-pol
> 0.8 J/cm2, 515 nm, 10 ps, 10 kHz, p-pol
> 1.3 J/cm2, 515 nm, 10 ps, 10 kHz, s-pol

Rs>99.95% & Rp>99.9% @ 505-530 nm, AOI=45° (ULLM3)

Calculated reflection values at 45° angle of incidence

 

Calculated GDD values at 45° angle of incidence

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These highly reflective dielectric mirrors designed for frequency-doubled Yb-based laser systems enable precise 90° redirection of green femtosecond and picosecond pulses while preserving beam quality. They are widely integrated into beam delivery and micromachining workstations to route the 515 nm beam through periscopes, relays, scan heads, and galvo modules, as well as into diagnostics and attenuation stages for monitoring and process control. Their low absorption coatings and high LIDT support stable long-term operation in green-beam paths where power density is high and alignment repeatability is critical.

Mirror can be used for II harmonic of Yb:YAG based ultrafast laser systems, such as:

  • “PHAROS” and “CARBIDE” by Light Conversion
  • “Monaco” series by Coherent
  • “FemtoBlade™” series by Lumentum
  • “TruMicro” series by TRUMPF
  • “IceFyre® FS” series by Spectra-Physics
  • “Satsuma” and “Tangor” series by Amplitude
  • “FemtoLux” series by EKSPLA
  • “FSL1030X2” by Thorlabs
  • “Jasper X1” by Fluence technology
  • “FS Series” by Photonics Industries

OPTOMAN’s Standard IBS-coated Ultrafast Laser Mirrors are designed to maintain high LIDT and minimize Group Delay Dispersion (GDD) for preserving pulse duration and handling high peak intensity of femtosecond and picosecond laser systems.

This mirror is optimized for operation at 515 nm and a 45° angle of incidence, providing high reflectivity and low GDD for ultrashort laser pulses.

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